Programming Strategy Optimization of RRAM Fabricated by 28 nm Standard CMOS Process
Yue Sun(Shanghai University), He Qian(University of Science and Technology of China), Tingying Shen, Xinyi Li(Institute of Microelectronics), Junyi Wang, Yongbo Liu, Shenghua Cheng(Dalian University of Technology), Xiaohu Wang(Hunan Institute of Technology), Bin Gao(Chinese Academy of Sciences)
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