Surface modification with hydroxyl calcium ions strengthen CMC selectively depress arsenopyrite: Bridging adsorption mechanism and application in Cu-As separation
Changtao Wang(Beijing Technology and Business University), Wei Sun(Hainan Normal University), Zhenhui Xie(Central South University), Runqing Liu(Central South University), Qilin Zhai(Kunming University of Science and Technology), Yuanjia Luo(Central South University), Zhengqiang Cao(Central South University)
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