Multi-Exposures with Dose Modulation of SU-8 Based on DMD Maskless Lithography for PDMS (Dimethylsiloxane) Microchannels

Qiming Chen, Yongjun Xu(Guangdong Polytechnic of Industry and Commerce), Renxuan Fu(Guangdong Polytechnic of Industry and Commerce), Junqi Gan(Guangdong Polytechnic of Industry and Commerce), Xianwen Song(Guangdong Polytechnic of Industry and Commerce), Jinyun Zhou(Guangdong University of Technology), Yibiao Liu(Longgang Central Hospital)
Advances in transdisciplinary engineering
December 15, 2022
10.3233/atde221160
Cited by 0

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