Enhancement of Breakdown Strength in Relaxor Ferroelectric Ba(Zr0.3ti0.7)O3 Thin Film Via Manipulating Growth Oxygen Pressure
Yiqun Liu(State Key Laboratory of New Ceramics and Fine Processing), Jing Ma(Tulane University), Shun Lan(Hong Kong Polytechnic University), Haojie Han(Tsinghua University), Hao Pan(University of California, Berkeley), Yuanhua Lin(Tsinghua University)
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