Catalytic Chemical Vapor Deposition (CCVD)

Dimitrios Peroulis(Purdue University West Lafayette), Reinhold Wannemacher, Stephen T.C. Wong(Cornell University), Michael S.-C. Lu, Gabriel Lopez‐Berestein(The University of Texas MD Anderson Cancer Center), J. Ashley Taylor, Tom N. Krupenkin(University of Wisconsin–Madison), Huikai Xie(Beijing Institute of Technology), Supone Manakasettharn, Hee Dong Han(IMEC), Sushanta K. Mitra(University of Waterloo), Avinash M. Dongare(University of Connecticut), Prashant R. Waghmare(University of Alberta), Yoke Khin Yap(Osaka University), N. R. Aluru, Armelle Baeza-Squiban, Sonja Boland(Centre National de la Recherche Scientifique), Jeong Young Park(Pohang University of Science and Technology), Yubo Fan(Hefei University of Technology), Alexey N. Volkov(University of Virginia), Wenguang Zhu(University of Science and Technology of China), Burcu Aslan, Marc Madou(Tecnológico de Monterrey), Weicong Li(Sun Yat-sen University), Francelyne Marano, Rina Guadagnini, Leonid V. Zhigilei(McCormick (United States)), A. T. Conlisk, Vishal V. R. Nandigana, Fernando Rodrigues‐Lima(Centre National de la Recherche Scientifique), Larry L. Howell(Brigham Young University), Ying Zhou(University College London), Anil K. Sood(The University of Texas MD Anderson Cancer Center), Zheng Yin, Seajin Oh, Harry Kwok, Hongwei Qu(Centre National de la Recherche Scientifique), Jean‐Marie Dupret(Centre National de la Recherche Scientifique), Gilbert Daniel Nessim(Bar-Ilan University)
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January 1, 2012
Cited by 0


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