Chemical vapor deposition of gold on Al2O3, SiO2, and TiO2 for the oxidation of CO and of H2
Mitsutaka Okumura(National Institute of Advanced Industrial Science and Technology), Shyunichi Nakamura(Osaka Institute of Technology), Susumu Tsubota(Midorigaoka Hospital), Toshiko Nakamura(National Institute of Advanced Industrial Science and Technology), Masashi Azuma(Osaka Institute of Technology), Masatake Haruta(Midorigaoka Hospital)
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