Antisymmetric Magnetoresistance in a van der Waals Antiferromagnetic/Ferromagnetic Layered MnPS<sub>3</sub>/Fe<sub>3</sub>GeTe<sub>2</sub> Stacking Heterostructure

Guojing Hu(University of Science and Technology of China), Yu‐Lun Chueh(National Sun Yat-sen University), Yuanmin Zhu(Dongguan University of Technology), Tzu‐Yi Yang(National Tsing Hua University), Bin Xiang(Chongqing University), Yalin Lu(Beijing Jiaotong University), Meng Huang(University of Science and Technology of China), Wenguang Zhu(University of Science and Technology of China), Junxiang Xiang(University of Science and Technology of China), Feng‐Chuan Chuang(National Sun Yat-sen University), Dazhi Hou(University of Science and Technology of China), Meng Gu(Southern University of Science and Technology), Zhi Wang(University of Science and Technology of China), Zhe Wang(Queen's University Belfast), Ping Liu(University of Science and Technology of China), Chao Feng(Chinese Academy of Sciences), Ying Zhang(State Key Laboratory of Chemical Engineering), Chia-Hsiu Hsu(National Sun Yat-sen University)
ACS Nano
September 4, 2020
Cited by 90


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