The formation mechanism of voids in physical vapor deposited AlN epilayer during high temperature annealing
Jianwei Ben(Shenzhen University), Dabing Li(Changchun Institute of Optics, Fine Mechanics and Physics), Xinke Liu(Shenzhen University), Xiaojuan Sun(Anyang Normal University), Wei Lü(Dalian University of Technology), Hang Zang(Chinese Academy of Sciences), Zhiming Shi(Chinese Academy of Sciences)
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