The formation mechanism of voids in physical vapor deposited AlN epilayer during high temperature annealing

Jianwei Ben(Shenzhen University), Dabing Li(Changchun Institute of Optics, Fine Mechanics and Physics), Xinke Liu(Shenzhen University), Xiaojuan Sun(Anyang Normal University), Wei Lü(Dalian University of Technology), Hang Zang(Chinese Academy of Sciences), Zhiming Shi(Chinese Academy of Sciences)
Applied Physics Letters
June 22, 2020
Cited by 36


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