Intensity modulation based optical proximity optimization for the maskless lithography

Jianghui Liu(Chinese Academy of Sciences), Song Hu(Shanghai Jiao Tong University), Shaolin Zhou(South China University of Technology), Junbo Liu(Chinese Academy of Sciences), Jinhua Feng(Chinese Academy of Sciences), Qingyuan Deng(Huazhong University of Science and Technology)
Optics Express
December 23, 2019
10.1364/oe.381503
Cited by 38

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