Formic Acid of ppm Enhances LC-MS/MS Detection of UV Irradiation-Induced DNA Dimeric Photoproducts

Ning Zhang(Chinese Academy of Sciences), Hailin Wang(Fujian Normal University), Yangde Ma(University of Chinese Academy of Sciences), Yao Li(University of North Carolina at Charlotte), Xiangjun Li(University of Nebraska–Lincoln), Yan Liu(Qingdao University), Wenchao Deng(Jianghan University)
Analytical Chemistry
November 30, 2019
10.1021/acs.analchem.9b04327
Cited by 17

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