Inhibition of AlF<sub>3</sub>·3H<sub>2</sub>O Impurity Formation in Ti<sub>3</sub>C<sub>2</sub>T<sub><i>x</i></sub> MXene Synthesis under a Unique CoF<sub><i>x</i></sub>/HCl Etching Environment
Cody B. Cockreham(Los Alamos National Laboratory), Di Wu(Washington State University), Ellis Hammond-Pereira(Washington State University), Houqian Li(Washington State University), Junming Sun(Dalian Institute of Chemical Physics), Yong Wang(Pacific Northwest National Laboratory), Steven R. Saunders(Washington State University), Xianghui Zhang(Washington State University), Hongwu Xu(Xi'an University of Architecture and Technology)
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