Residual stress–driven test technique for freestanding ultrathin films: Elastic behavior and residual strain
Gayatri Cuddalorepatta(Harvard University), Joost J. Vlassak(Harvard University), Daniel Pantuso(Intel (United States)), Gi‐Dong Sim(Korea Advanced Institute of Science and Technology), Han Li(Guangzhou University)
Journal of materials research/Pratt's guide to venture capital sources
October 14, 2019
Cited by 8
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