Patterning of high-aspect-ratio nanogratings using phase-locked two-beam fiber-optic interference lithography

Zhuofei Gan(University of Hong Kong), Wen‐Di Li(Institut de Recherche et d’Innovation), Siyi Min(Southern University of Science and Technology), Liyang Chen(Hunan Normal University), Chuwei Liang(University of Hong Kong), Jingxuan Cai(Zhejiang University), Dehu Cui(Southern University of Science and Technology), Xing Cheng(Southern University of Science and Technology)
Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena
October 8, 2019
Cited by 14


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