Atomic-Scale Mechanisms for Interfacial Radiation Damage Resistance of Thin Film Oxide Heterostructures

Steven R. Spurgeon(National Laboratory of the Rockies), V. Shutthanandan(Pacific Northwest National Laboratory), Weilin Jiang(Pacific Northwest National Laboratory), Michel Sassi(Pacific Northwest National Laboratory), Tiffany C. Kaspar(Pacific Northwest National Laboratory)
Microscopy and Microanalysis
August 1, 2019
10.1017/s1431927619008547
Cited by 0

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