Ultra-fast NH4+ Storage: Strong H Bonding between NH4+ and Bi-layered V2O5

Shengyang Dong; Woochul Shin; Heng Jiang; Xianyong Wu; Zhifei Li; John Holoubek; William F. Stickle; Baris Key; Cong Liu; Jun Lü; P. Alex Greaney; Xiaogang Zhang; Xiulei Ji

doi:10.1016/j.chempr.2019.03.009

Ultra-fast NH4+ Storage: Strong H Bonding between NH4+ and Bi-layered V2O5

Shengyang Dong(Oregon State University), Woochul Shin(Oregon State University), Heng Jiang(Oregon State University), Xianyong Wu(Oregon State University), Zhifei Li(Oregon State University), John Holoubek(Oregon State University), William F. Stickle(Hewlett-Packard (United States)), Baris Key(Argonne National Laboratory), Cong Liu(Argonne National Laboratory), Jun Lü(Argonne National Laboratory), P. Alex Greaney(University of California, Riverside), Xiaogang Zhang(Nanjing University of Aeronautics and Astronautics), Xiulei Ji(Oregon State University)

Chem

April 11, 2019

10.1016/j.chempr.2019.03.009

Cited by 357Open Access

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