Photosensitive ZrO2 suspensions for stereolithography
Keqiang Zhang(Beijing Institute of Technology), Daining Fang(Beijing Institute of Technology), Weidong Song(Liaoning Technical University), Min Wang(Twelfth Guangzhou City People's Hospital), Rujie He(Beijing Institute of Technology), Guojiao Ding(Beijing Institute of Technology), Gang Wang(Anhui Polytechnic University), Chen Xie(Centre National de la Recherche Scientifique)
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