Pseudogap Control of Physical and Chemical Properties in CeFeSi-Type Intermetallics
Jiazhen Wu(Southern University of Science and Technology), Hideo Hosono(National Institute for Materials Science), Takeshi Inoshita(Tokyo Institute of Technology), Masaaki Kitano(Tohoku University), Yangfan Lu(Chongqing University), Jiang Li(Sichuan University), Erdong Lu(University of Wisconsin–Madison), Daniel C. Fredrickson(Tokyo Institute of Technology)
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