Large area patterning of residue-free metal oxide nanostructures by liquid transfer imprint lithography
Suok Lee(Korea Basic Science Institute), Jaejong Lee(Korea Institute of Machinery & Materials), Seong In Yoon(Ulsan National Institute of Science and Technology), Hyeon Suk Shin(Institute for Basic Science), Hyun Uk Lee(Korea Institute of Nuclear Safety), Sang Hee Jung(Korea Institute of Machinery & Materials), A‐Rang Jang(Ulsan National Institute of Science and Technology)
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