Highly preferred orientation of Ga2O3 films sputtered on SiC substrates for deep UV photodetector application
Meng‐Qiu Li(Harbin Institute of Technology), Ni Yang(Harbin Institute of Technology), Gui‐Gen Wang(Harbin Institute of Technology), Huayu Zhang(Harbin Institute of Technology), Jiecai Han(Harbin Institute of Technology)
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