The rapid response of 2/1 tearing mode to electrode biasing in J-TEXT experiments
Tong Wang(North China Electric Power University), Li Gao(State Key Laboratory of Advanced Electromagnetic Engineering and Technology), Zhifeng Cheng(Huazhong University of Science and Technology), Nengchao Wang(Plasma Technology (United States)), Zhoujun Yang(Huazhong University of Science and Technology), Yonghua Ding(Huazhong University of Science and Technology), Zhongyong Chen(Huazhong University of Science and Technology), Peng Shi(Culham Science Centre), Qiming Hu(Princeton Plasma Physics Laboratory), Minghui Xia(Huazhong University of Science and Technology), Mingxiang Huang(Huazhong University of Science and Technology), Chengshuo Shen(Huazhong University of Science and Technology), Zhipeng Chen(Zhengzhou University), Hai Liu, Da Li, Jie Yang(Chinese Academy of Sciences), G. Zhuang(University of Science and Technology of China), Yuan Huang(Huazhong University of Science and Technology), Q. Yu(Max Planck Institute for Plasma Physics), Lizhi Zhu
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