Polymer-Pen Chemical Lift-Off Lithography
Xiaobin Xu(California NanoSystems Institute), Paul S. Weiss(University of California, Los Angeles), Chuanzhen Zhao(Stanford University), Chad A. Mirkin(Northwestern University), Anne M. Andrews(California NanoSystems Institute), John M. Abendroth(ETH Zurich), Kevin M. Cheung(California NanoSystems Institute), Liane S. Slaughter(Northwestern University), Natcha Wattanatorn(California NanoSystems Institute), Qing Yang(California NanoSystems Institute), Jason N. Belling(Northwestern University)
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