Bottom-Up Fabrication of Sulfur-Doped Graphene Films Derived from Sulfur-Annulated Nanographene for Ultrahigh Volumetric Capacitance Micro-Supercapacitors
Zhong‐Shuai Wu(Dalian Institute of Chemical Physics), Kläus Müllen(VSB - Technical University of Ostrava), Xiaoyu Shi(Chinese Academy of Sciences), Khaled Parvez(University of Manchester), Jieqiong Qin(Dalian Institute of Chemical Physics), Chenglin Sun(Dalian Institute of Chemical Physics), Sen Wang(University of Chinese Academy of Sciences), Xinliang Feng(Max Planck Institute of Microstructure Physics), Xinhe Bao(University of Science and Technology of China), Shuanghao Zheng(Dalian Institute of Chemical Physics), Yuan‐Zhi Tan(Xiamen University)
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