Influence of fin number on hot-carrier injection stress induced degradation in bulk FinFETs
Wenqi Zhang(Chinese Academy of Sciences), Yi-Lin Yang(Soochow University), Chun-Hsiang Hsu(National Kaohsiung Normal University), Tzuo-Li Wang(National Kaohsiung Normal University), Tsu-Ting Cheng(National University of Kaohsiung), Yiying Li(Xi’an Jiaotong-Liverpool University), Wen‐Kuan Yeh(National University of Kaohsiung), Yan‐Hua Huang(China University of Mining and Technology), C. J. Lai(National Kaohsiung Normal University), Shih‐Yao Chen(Chung Hwa University of Medical Technology)
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