Controlled Chlorine Plasma Reaction for Noninvasive Graphene Doping

Justin Z. Wu(Stanford University), Hongjie Dai(Xiangtan University), Jing Guo(University of Science and Technology of China), Yanguang Li(Soochow University), Yijian Ouyang(University of Florida), Liming Xie(University of Macau), Hailiang Wang(Weifang People's Hospital)
Journal of the American Chemical Society
November 14, 2011
Cited by 238


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