Modeling the reactive sputter deposition of Ti-doped VO <sub> <b> <i>x</i> </b> </sub> thin films
Tao Wang(North China University of Science and Technology), Ruilin Wu(University of Illinois Urbana-Champaign), Deen Gu(University of Electronic Science and Technology of China), He Yu(University of Electronic Science and Technology of China), Xiang Dong(University of Electronic Science and Technology of China), Yadong Jiang(Fudan University), Rui Guo(University of Electronic Science and Technology of China)
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