Mechanical properties of porous and fully dense low-κ dielectric thin films measured by means of nanoindentation and the plane-strain bulge test technique

Yong Xiang(University of Electronic Science and Technology of China), Joost J. Vlassak(Harvard University), Ting Y. Tsui(Advanced Micro Devices (United States)), Jae‐il Jang(Hanyang University), Xi Chen(Beijing Jiaotong University)
Journal of materials research/Pratt's guide to venture capital sources
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