Modeling the gate bias dependence of contact resistance in staggered polycrystalline organic thin film transistors
Vincenzo Vinciguerra(STMicroelectronics (Switzerland)), Luigi G. Occhipinti(STMicroelectronics (Italy)), Donata Nicolosi(STMicroelectronics (Italy)), Manuela La Rosa(STMicroelectronics (Italy)), Giovanni Sicurella(STMicroelectronics (Italy))
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