The investigation of key technologies for sub-0.1-μm CMOS device fabrication

Xu Qiuxia(Institute of Microelectronics), Dexin Wu(Institute of Microelectronics), Baoqing Chen(Institute of Microelectronics), Honghao Ji(Institute of Microelectronics), Huanzhang Hu(Institute of Microelectronics), Yajiang Zhu(Institute of Microelectronics), He Qian(University of Science and Technology of China), Lin Jia(Institute of Microelectronics), Zhensheng Han(Institute of Microelectronics), Min Liu(Anhui Medical University), Huaxiang Yin(Chinese Academy of Sciences)
IEEE Transactions on Electron Devices
July 1, 2001
10.1109/16.930660
Cited by 11

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