Gate Injection Transistor (GIT)—A Normally-Off AlGaN/GaN Power Transistor Using Conductivity Modulation

Yasuhiro Uemoto(Panasonic (Japan)), Masahiro Hikita(Panasonic (Japan)), Hiroaki Ueno(Panasonic (Japan)), Hisayoshi Matsuo(Panasonic (Japan)), Hidetoshi Ishida(Panasonic (Japan)), Manabu Yanagihara(Panasonic (Japan)), Tetsuzo Ueda(Panasonic (Japan)), Tsuyoshi Tanaka(Panasonic (Japan)), Daisuke Ueda(Panasonic (Japan))
IEEE Transactions on Electron Devices
January 1, 2007
Cited by 992

Abstract

<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> We have developed a normally-off GaN-based transistor using conductivity modulation, which we call a gate injection transistor (GIT). This new device principle utilizes hole-injection from the p-AlGaN to the AlGaN/GaN heterojunction, which simultaneously increases the electron density in the channel, resulting in a dramatic increase of the drain current owing to the conductivity modulation. The fabricated GIT exhibits a threshold voltage of 1.0 V with a maximum drain current of 200 mA/mm, in which a forward gate voltage of up to 6 V can be applied. The obtained specific <emphasis emphasistype="smcaps">ON</emphasis>-state resistance (<formula formulatype="inline"><tex>$R_{ \scriptstyle{\rm ON} } \cdot A$</tex></formula>) and the <emphasis emphasistype="smcaps">OFF</emphasis>-state breakdown voltage (<formula formulatype="inline"><tex>$\hbox{BV}_{\rm ds}$</tex></formula>) are 2.6 <formula formulatype="inline"><tex>$\hbox{m}\Omega\cdot \hbox{cm}^{2}$</tex></formula> and 800 V, respectively. The developed GIT is advantageous for power switching applications. </para>


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