Comparative study of ITO layers deposited by DC and RF magnetron sputtering at room temperature
F. Kurdesau(ETH Zurich), Ayodhya N. Tiwari(Swiss Federal Laboratories for Materials Science and Technology), A.F. da Cunha(University of Aveiro), M. Kaelin(ETH Zurich), Г.С. Хрипунов(National Technical University "Kharkiv Polytechnic Institute")
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