AlN bulk single crystal growth on SiC and AlN substrates by sublimation method
Ichiro Nagai(National Institute of Advanced Industrial Science and Technology), Hajime Okumura(bioMérieux (United States)), Kunihiro Naoe(Fujikura (Japan)), Tomohisa Kato(National Institute of Advanced Industrial Science and Technology), Tomonori Miura(National Institute of Advanced Industrial Science and Technology), Hiroyuki Kamata(Jichi Medical University), Kazuo Sanada(Fujikura (Japan))
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