Growth and properties of silicon nitride films prepared by low pressure chemical vapor deposition using trichlorosilane and ammonia
Xuejian Liu(Zhengzhou University), Chengyu Jin(Shanghai Jiao Tong University), Junji Zhang(East China University of Science and Technology), Liping Huang(Chinese Academy of Sciences), Yubai Pan(Chinese Academy of Sciences), Xingwei Sun(Chinese Academy of Sciences)
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