Band dispersion near the Fermi level for<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mtext>VO</mml:mtext></mml:mrow><mml:mn>2</mml:mn></mml:msub></mml:mrow></mml:math>thin films grown on<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mtext>TiO</mml:mtext></mml:mrow><mml:mn>2</mml:mn></mml:msub></mml:mrow></mml:math>(001) substrates
Kyosuke Saeki(Ehime Prefectural Central Hospital), Shik Shin(The University of Tokyo), Ritsuko Eguchi(SPring-8), Takanori Wakita(Japan Synchrotron Radiation Research Institute), Masaaki Hirai(Okayama University), Yuji Muraoka(Okayama University of Science), T. Yokoya(The University of Tokyo)
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