Nucleation and Adhesion of ALD Copper on Cobalt Adhesion Layers and Tungsten Nitride Diffusion Barriers

Zhengwen Li(Chengdu University), Joost J. Vlassak(Harvard University), Roy G. Gordon(Harvard University), Damon B. Farmer(IBM (United States)), Youbo Lin(Harvard University)
Electrochemical and Solid-State Letters
January 1, 2005
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