Polymerization blending for compatible poly(ether sulfone)/aramid blend based on polycondensation of an <i>N</i>‐silylated aromatic diamine with an aromatic diacid chloride in poly(ether sulfone) solution
Hideo Hayashi(Tokyo Metropolitan Industrial Technology Research Institute), Yoshio Imai(Tokyo Institute of Technology), Shoichi Nakata(Université Laval), Masa‐aki Kakimoto(Tokyo Institute of Technology)
Cited by 6
Related Papers
Photo Alignment Materials with High Sensitivity to Near UV Light.
|Journal of Photopolymer Science and Technology|1998|46
Preparation of aromatic copolyamides containing regularly placed 1,6-hexamethylenediamine units
|Journal of Polymer Science Part A Polymer Chemistry|1997|31
Strong Liquid Crystal Anchoring on Photo-Alignment Copolymer Films Containing ω-(4-chalconyloxy)alkyl Side Groups
|Japanese Journal of Applied Physics|2001|22
Aramid/poly(ether sulphone) blend: crystallization accelerated by the presence of amorphous polymer
|Polymer|1992|21
Photo-Rubbing: A General Method to Induce Durable Liquid-Crystal Pretilt Angle on Photo-Alignment Films
|Japanese Journal of Applied Physics|2002|16