Facile and scalable patterning of sublithographic scale uniform nanowires by ultra-thin AAO free-standing membrane
Gang Meng(State Key Laboratory of Remote Sensing Science), Tomoji Kawai(Osaka Research Institute of Industrial Science and Technology), Hideki Masuda(University of Shanghai for Science and Technology), Takashi Yanagishita(Tokyo Metropolitan University), Sakon Rahong(The University of Osaka), Bo Xu(Shenzhen University), Annop Klamchuen(The University of Osaka), Kazuki Nagashima(The University of Osaka), Masaki Kanai(The University of Osaka), Takeshi Yanagida(Kyushu University), Fuwei Zhuge(The University of Osaka), Yong He(The University of Osaka), Keisuke Oka(The University of Osaka), Mati Horprathum(National Electronics and Computer Technology Center)
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