EB-X3: New electron-beam x-ray mask writer

Tetsuo Morosawa(NTT (Japan)), Yasuji Matsui(Association of Super-Advanced Electronics), Kenichi Saito(Zenyaku Kogyo (Japan)), Akira Shimizu(Nippon Medical School), Youichi Kuriyama(NTT (Japan)), Junichi Kato(Hiroshima University), Tadahito Matsuda(NTT (Japan)), Yoshinori Nakayama(Association of Super-Advanced Electronics), Tatsuya Kunioka(NTT (Japan)), Yuji Takeda(NTT (Japan))
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
November 1, 1999
Cited by 19


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