Bombardment-induced silicide formation at rhenium-silicon interfaces studied by XPS and TEM
R. Reiche(Leibniz Institute for Solid State and Materials Research), K. Wetzig(Leibniz Institute for Solid State and Materials Research), J. Thomas(University of Calicut), Steffen Oswald(Leibniz Institute for Solid State and Materials Research), D. Hofman(Leibniz Institute for Solid State and Materials Research)
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