Modeling for calculation of vanadium oxide film composition in reactive-sputtering process
He Yu(University of Electronic Science and Technology of China), Xiongbang Wei(University of Electronic Science and Technology of China), Zhiming Wu(University of Electronic Science and Technology of China), Junsheng Yu(University of Electronic Science and Technology of China), Tao Wang(University of Electronic Science and Technology of China), Yadong Jiang(Ollscoil na Gaillimhe – University of Galway)
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