Image reversal trilayer process using standard positive photoresist
David J. Abdallah, Ralph R. Dammel(SunEdison (United States)), John P. Sagan(SunEdison (United States)), Yasuo Shimizu(Tohoku University), Tomonori Ishikawa, Kazunori Kurosawa, Jin Li(Shenyang Medical College), Yusuke Takano, Tatsuro Nagahara
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
March 13, 2009
Cited by 4
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