Suppression of penetration of aluminum into 8-hydroxyquinoline aluminum via a thin oxide barrier
Mengbing Huang(Vanderbilt University), L. C. Feldman(AT&T (United States)), Robert A. Weller(Vanderbilt University), K. McDonald(Vanderbilt University), Sandra J. Rosenthal(Vanderbilt University), Yalong Wang(State Key Laboratory of Chemical Engineering), J. C. Keay(Vanderbilt University)
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