Fabrication of ramp-type junctions using a two angle ion beam etching process

U. Schoop(University of Cologne), M. Schonecke, Thilo Bauch(University of Cologne), Lambert Alff(Technische Universität Darmstadt), Achim Marx(Bavarian Academy of Sciences and Humanities), B. Wiedenhorst(Infineon Technologies (Germany)), S. Schymon(University of Cologne)
Superconductor Science and Technology
November 1, 1999
10.1088/0953-2048/12/11/396
Cited by 3

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