Picosecond Pulsed X-Ray Diffraction from a Pulsed Laser Heated Si(111)
Yoichiro Hironaka(Institute for Laser Technology), Masatake Yoshida(National Institute for Materials Science), Kazutaka G. Nakamura(Tokyo Institute of Technology), Yasushi Fujimoto(Tokyo Institute of Technology), Tomoharu Inoue(Tokyo Institute of Technology), Tomoyuki Tange(Tokyo Institute of Technology), Ken‐ichi Kondo(Tokyo Institute of Technology)
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