Enhancement of saturation magnetization in Cr-ion implanted silicon by high temperature annealing
Shuang Yang(Chongqing University), Honglin Du(Peking University), Congxiao Liu(Duke Medical Center), Zhongpo Zhou(Henan Normal University), Liping Guo(Qilu University of Technology), Jihong Chen(Nanjing University), Zhiwei Ai(Wuhan University), Wenyong Zhang(Wuhan University)
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