Analysis of fabrication tolerance based on uneven thickness of Su8-photo-resist

Qing Tao(Xinjiang University), Qianliang Liang(Wuhan National Laboratory for Optoelectronics), Dandan Miao(Wuhan National Laboratory for Optoelectronics), Rui Zhong(Chinese Academy of Medical Sciences & Peking Union Medical College), Bingcheng Mo(Wuhan National Laboratory for Optoelectronics), Fengguang Luo(Wuhan National Laboratory for Optoelectronics), Xiaoxing Pan(Wuhan National Laboratory for Optoelectronics), Jinxing Zhang(Beijing Normal University)
Journal of Optical Technology
May 1, 2013
Cited by 0


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