Influence of the growth temperature of AlN nucleation layer on AlN template grown by high-temperature MOCVD
Yiren Chen(Chinese Academy of Sciences), Yue Zhou(University of Science and Technology of China), Zhiwei Zhang(Liaocheng University), Zhiming Li(Shenzhen University), Guoqing Miao(Chinese Academy of Sciences), Hang Song(Shanghai Jiao Tong University), Dabing Li(Changchun Institute of Optics, Fine Mechanics and Physics), Hong Jiang(Southwest Petroleum University), Xiaojuan Sun(Anyang Normal University)
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