Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

H. B. Nie; Shuling Xu; S.J. Wang; L. P. You; Zhou Yang; C. K. Ong; Jie Li; T. Liew

doi:10.1007/s003390000691

Structural and electrical properties of tantalum nitride thin films fabricated by using reactive radio-frequency magnetron sputtering

H. B. Nie(National University of Singapore), Shuling Xu(National University of Singapore), S.J. Wang(National University of Singapore), L. P. You(National University of Singapore), Zhou Yang(National University of Singapore), C. K. Ong(National University of Singapore), Jie Li(National University of Singapore), T. Liew(Data Storage Institute)

Applied Physics A

August 1, 2001

10.1007/s003390000691

Cited by 172

Abstract

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