Structural and electronic properties of epitaxial thin-layer<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Si</mml:mi></mml:mrow><mml:mrow><mml:mi mathvariant="normal">n</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">Ge</mml:mi></mml:mrow><mml:mrow><mml:mi mathvariant="normal">n</mml:mi></mml:mrow></mml:msub></mml:mrow></mml:math>superlattices

Sverre Froyen(National Renewable Energy Laboratory), D. M. Wood(National Renewable Energy Laboratory), Alex Zunger(National Renewable Energy Laboratory)
Physical review. B, Condensed matter
April 15, 1988
Cited by 188

Abstract

We examine theoretically structural and electronic properties of thin ${\mathrm{Si}}_{\mathrm{n}}$${\mathrm{Ge}}_{\mathrm{n}}$ superlattices for n=1, 2, 4, and 6, grown on (001)-oriented substrates. The increased repeat distance along the growth direction leads to folding of conduction-band states to the \ensuremath{\Gamma} point of the superlattice Brillouin zone, resulting in a significant reduction in the minimum direct band gap. Transitions to these folded-in states have nonzero dipole matrix elements because of (i) atomic relaxation, leading to the accommodation of distinct Si-Si and Ge-Ge bond lengths and (ii) the superlattice ordering potential. Our calculations show that superlattices grown pseudomorphically on a Si substrate remain indirect-band-gap structures, with a minimum gap from \ensuremath{\Gamma} to \ensuremath{\Delta} (near the X point) of the fcc Brillouin zone. We find, however, that increasing the lattice parameter ${a}_{s}$ of the substrate will further reduce the direct band gap. For ${a}_{s}$\ensuremath{\gtrsim}\ifmmode \bar{a}\else \={a}\fi{}, where \ifmmode \bar{a}\else \={a}\fi{} is the average of the lattice constants for Si and Ge, we predict a nearly direct band gap: For ${\mathrm{Si}}_{6}$${\mathrm{Ge}}_{6}$ the indirect band gap for ${a}_{s}$=\ifmmode \bar{a}\else \={a}\fi{} is only \ensuremath{\sim}0.01 eV smaller than the direct band gap. The lowest conduction-band states in this case are localized on the Si sublattice.


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