Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification
Zhiqiang Zhang(Chinese Academy of Sciences), Haiwen Li(Sun Yat-sen University), Wuping Zhou(Chinese Academy of Sciences), Yihui Wu(Dalian Institute of Chemical Physics), Cong Liu(Chinese Academy of Sciences), Huigao Duan(Agency for Science, Technology and Research), Yuguo Tang(Chinese Academy of Sciences)
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