Improving the adhesion of hydrogen silsesquioxane (HSQ) onto various substrates for electron-beam lithography by surface chemical modification

Zhiqiang Zhang(Chinese Academy of Sciences), Haiwen Li(Sun Yat-sen University), Wuping Zhou(Chinese Academy of Sciences), Yihui Wu(Dalian Institute of Chemical Physics), Cong Liu(Chinese Academy of Sciences), Huigao Duan(Agency for Science, Technology and Research), Yuguo Tang(Chinese Academy of Sciences)
Microelectronic Engineering
May 21, 2014
Cited by 14


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