Influence of interdiffusion on the magnetic properties of Co/Si (100) films after high magnetic field annealing
Yue Zhao(Northeastern University), Jicheng He(Northeastern University), Changsheng Lou(Shenyang Ligong University), Hongxuan Pang(Ministry of Education of the People's Republic of China), Kai Wang(Guilin University of Electronic Technology), Qiang Wang(Chongqing Jiaotong University), Guojian Li(Northwestern Polytechnical University)
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